Nanotechnology -Evaporation

Evaporation

In evaporation the substrate is placed inside a vacuum chamber, in which a block (source) of the material to be deposited is also located. The source material is then heated to the point where it starts to boil and evaporate. The vacuum is required to allow the molecules to evaporate freely in the chamber, and they subsequently condense on all surfaces. This principle is the same for all evaporation technologies, only the method used to the heat (evaporate) the source material differs. There are two popular evaporation technologies, which are e-beam evaporation and resistive evaporation each referring to the heating method. In e-beam evaporation, an electron beam is aimed at the source material causing local heating and evaporation. In resistive evaporation, a tungsten boat, containing the source material, is heated electrically with a high current to make the material evaporate. Many materials are restrictive in terms of what evaporation method can be used (i.e. aluminum is quite difficult to evaporate using resistive heating), which typically relates to the phase transition properties of that material. A schematic diagram of a typical system for e-beam evaporation is shown in the figure below.

Typical system for e-beam evaporation of materials
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posted by nanoportal at 11:05 AM | Permalink


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