Nanotechnology - Casting

Casting
In this process the material to be deposited is dissolved in liquid form in a solvent. The material can be applied to the substrate by spraying or spinning. Once the solvent is evaporated, a thin film of the material remains on the substrate. This is particularly useful for polymer materials, which may be easily dissolved in organic solvents, and it is the common method used to apply photoresist to substrates (in photolithography). The thicknesses that can be cast on a substrate range all the way from a single monolayer of molecules (adhesion promotion) to tens of micrometers. In recent years, the casting technology has also been applied to form films of glass materials on substrates. The spin casting process is illustrated in the figure below.
When to use casting?
Casting is a simple technology which can be used for a variety of materials (mostly polymers). The control on film thickness depends on exact conditions, but can be sustained within +/-10% in a wide range. If you are planning to use photolithography you will be using casting, which is an integral part of that technology. There are also other interesting materials such as polyimide and spin-on glass which can be applied by casting.

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posted by nanoportal at 12:29 AM | Permalink


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